Design Choice in 45-nm Dual-Port SRAM - 8T, 10T Single End, and 10T Differential
نویسندگان
چکیده
As process technology is scaled down, a large-capacity SRAM will be used. Its power must be lowered. The V th variation of the deep-submicron process affects the SRAM operation and its power. This paper compares the macro area, readout power, and operating frequency among dual-port SRAMs: an 8T SRAM, 10T single-end SRAM, and 10T differential SRAM considering the multi-media applications. The 8T SRAM has the lowest transistor count, and is the most area efficient. However, the readout power becomes large and the access time increases because of peripheral circuits. The 10T single-end SRAM, in which a dedicated inverter and transmission gate are appended as a singleend read port, can reduce the readout power by 74%. The operating frequency is improved by 195%, over the 8T SRAM. However, the 10T differential SRAM can operate fastest (256% faster than the 8T SRAM) because its small differential voltage of 50mV achieves high-speed operation. In terms of the power efficiency, however, the readout current is affected by the V th variation and the timing of sense cannot be optimized singularly among all memory cells in a 45-nm technology. The readout power remains 34% lower than that of the 8T SRAM (33% higher than the 10T single-end SRAM); even its operating voltage is the lowest of the three. The 10T single-end SRAM always consumes less readout power than the 8T or 10T differential SRAM.
منابع مشابه
A 45 nm 10T Dual-Port SRAM with Shared Bit-Line Scheme for Low Power Operation
This paper proposes a 10T bit-cell of dual-port (DP) SRAM design to improve Static Noise Margin (SNM) and solve write/read disturb issues in nano-scale CMOS technologies. In additional used the row access transistor in the bit-cell, adding Y -access MOS (column-direction access transistor) can improve dummy-read cells’ noise margin and isolate the pre-charge noise from bit-lines in synchronous ...
متن کامل12th Int'l Symposium on Quality Electronic Design
Bias Temperature Instability (BTI) causes significant threshold voltage shift in MOSFET using Hafnium-dioxide (HfO2) High-k dielectric material. Negative BTI and Positive BTI are two types of BTI effects observed in p-channel and n-channel MOSFET. BTI affects the stability and reliability of conventional six transistor (6T) SRAM design in nano-scale CMOS technology. Eight transistor (8T) and Te...
متن کاملA 10T Non-precharge Two-Port SRAM Reducing Readout Power for Video Processing
We propose a low-power non-precharge-type two-port SRAM for video processing that exploits statistical similarity in images. To minimize the charge/discharge power on a read bitline, the proposed memory cell (MC) has ten transistors (10T), comprised of the conventional 6T MC, a readout inverter and a transmission gate for a read port. In addition, to incorporate three wordlines, we propose a sh...
متن کاملLow Power 10T SRAM Design for Dynamic Power Reduction
The aim of paper is to get over the problem of 6T SRAM cell where it loses its reliability at low supplies due to degraded noise margins. These is done by using a 10T SRAM where the cell uses a charge sharing technique between the transistors so that SRAM could be made more rigid against the noises that can cause damage to the cell at low power supplies and along with that charge sharing betwee...
متن کاملComparative Analysis of Sram Cell Designs in Nano-scale Technology
Bias Temperature Instability (BTI) is a major reliability issue in Nano-Scale CMOS circuits. BTI effect results in the threshold voltage increase of MOS devices over time. Given the Process, Voltage, and Temperature (PVT) dependence of BTI effect, and the significant amount of PVT variations in Nano-scale CMOS, we propose a method of combining the effects of PVT variations and the BTI effect fo...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید
ثبت ناماگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید
ورودعنوان ژورنال:
- IPSJ Trans. System LSI Design Methodology
دوره 4 شماره
صفحات -
تاریخ انتشار 2011